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Rapid Thermal Processing
System
The Ecopia RTP-1200
model is a relatively low cost, easy-to-use, yet powerful rapid thermal processing system which can quickly
increase materials to a very high temperature using four tungsten-halogen lamps. Researchers in industry, national
laboratories, and university settings can obtain accurate test data quickly while enjoying simple installation and
operation. The RTP-1200 provides convenience and power at a very reasonable price.
Features and Benefits
- Heat treatment in high vacuum
- Heat treatment in ambient atmosphere
- High accuracy temperature control
- Additional cooling system not required
- Compact desktop design
- Very competitive price
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Unit
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Specification
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Remark
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Max sample size
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mm
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12 x 12mm, 15 x 15mm
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Option
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Maximum rising speed
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°c/sec
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100
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Maximum Cooling speed
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sec
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50
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1000 °c ->
400 °c
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Max temp
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°c
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1200
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Temp accuracy
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°c
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+/-0.3
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@1000 °
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Lamp power
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W
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600
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Size
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Cm
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40 x 30 x 45
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Weight
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Kg
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30
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Voltage rate
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V
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220V, single phase
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RTP system mechanism view
Applications:
- Thin film deposition
- Oxidize thin film on the sample
- Construction analysis of thin film at high temperature
- Paste material analysis
- Ohmic contact formation by .i.e Ag.Au electrical conductivity material
- Heat treatment after ion implantation and activating ion implantation
- Melting point analysis of alloys
Characteristics:
- Easy to use thermal treatment in vacuum status, purge gas flow, and at ambient
atmosphere
- No need for additional cooling system
- Minimized radiant heat through use of IR reflective panel
- Easy load and unload of sample
- Compact desktop design, easy to install and move
- Accurate temperature control by temperature sensor located in sample loading
stage
- Possible to use for furnace applications requiring +/- 3°c
accuracy.
Ecopia RTP 1200 data
sheet 
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